用于在基质中精确种植种子并施加处理物质。
专利摘要
一种在具有至少一个种植位置的基质中对种子和/或可种植材料进行处理和播种或种植的方法,包括按任意顺序:(a)通过处理沉积装置在处理位置处或附近沉积处理物质来处理种子和/或可种植材料;以及(b)通过种子和/或可种植材料沉积装置在种植位置处沉积种子和/或可种植材料;(c)使基质与处理沉积装置和种子和/或可种植材料沉积装置中的至少一个相对位移;(d)提供具有至少两个种植位置的基质,这些种植位置在过程之前独立地以预定义距离在相对位移方向上形成;以及(e)基于沉积轨迹、沉积时间和沉积装置相对于基质的移动速度中的至少一个,控制处理沉积装置和种子和/或可种植材料沉积装置,以在基质中的预定义种植位置处沉积至少一个种子和/或可种植材料样本以及期望量的处理物质。
Original abstractA method of treatment and seeding or planting of seeds and/or plantable material in a substrate with at least one planting position, including in any order: (a) treating the seeds and/or the plantable material with a treatment substance by depositing the treatment substance in or at the planting position with the aid of treatment depositing device; and (b) depositing the seeds and/or the plantable material at the planting position with the aid of a seed and/or plantable material depositing device; (c) displacing the substrate and at least one of the treatment depositing device and the seed and/or plantable material depositing device relative to one another; (d) providing a substrate having at least two plant positions formed independently from the process in advance thereof at a pre-defined distance in the direction of relative displacement; and (e) controlling the treatment depositing device and the seed and/or plantable material depositing device for depositing at least one specimen of the seeds and/or the plantable material and a desired amount of treatment substance for deposition thereof at the pre-defined planting positions in the substrate on the basis of at least one of the group consisting of: a depositing trajectory, a depositing time, and a speed of movement from the depositing means relative to the substrate.
专利附图(共 2 张)


法律状态与事件
2015-01-27
Patent granted
2018-07-27
Maintenance fee paid (4th year)
2022-09-19
Maintenance fee reminder mailed
2023-03-06
Patent lapsed due to failure to pay maintenance fees under 37 CFR 1.362
2023-03-28
Lapse effective date (January 27, 2023)
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